Mark detection in electron beam lithography using evaluation of wave signal symmetry

Источник: sciencedirect


Central Research Laboratory, Hitachi Ltd., Kokubunji Tokyo 185, Japan
Instruments Division, Hitachi Ltd., Katsuta Ibaraki 312, Japan


A new mark detection method has been developed using the symmetry of mark signals. The calculation of the symmetry is executed by a digital signal processor in order to reduce the detection time to less than 100 msec. Detection accuracy is estimated by a simulator. Calculated accuracy is compared with experiment results. The detection system is adopted in a new electron beam lithography system(1).

Microelectronic Engineering

Volume 21, Issues 1-4, April 1993, Pages 165-168

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